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Research Interests

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Our research group focuses on an effort to understand various surface phenomena such as adsorption configuration of organic and bio molecules on semiconductor surfaces and reaction mechanism on heterogeneous catalysts.

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  • Functionalization of semiconductor surface

  • Reaction mechanism of catalysts

  • Characterization for polarized IR light-emitting material

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Resources

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Ultra-high vacuum (UHV) system

○ Base pressure : 2.0 x 10^-10 Torr

○ Components 

  - Pumps : Rotary, Turbo, Ion, TSP pumps

  - Sputter gun : RBD Instruments IG2 ion source

  - Gauge : Granville-Phillips 307 Vacuum gauge
                   controller with nude gauges & Pirani gauge

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Jaguar
: DFT calculations

○ Operating system : Linux CentOS 7

○ Software : SCHRODINGER Jaguar version 10.9

○ Hardware I
  - CPU : Intel Xeon Gold 6326 (16-Core, 2.9GHz) * 2EA
  - RAM : Samsung DDR4 PC4-25600 ECC 256G

○ Hardware II
  - CPU : AMD Ryzen Threadripper 3970X 

               (32-Core, 3.7GHz)
  - RAM : Samsung DDR4 PC4-25600 128G

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Glove box

○ Model : GBI GB-G1000AD

○ Auto control system (8" LCD touch control panel)

○ Atmosphere : Argon

○ Components

  - Purification system (55cfm blower system)

  - Oxygen analyzer (resolution : 0.1 ppm)

  - Moisture analyzer (resolution : 0.1 ppm)

  - Auto cooling system with temperature sensor

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Autoclave

○ Touch screen control panel

○ Volume : 700 mL

○ Max. working pressure : 155 bar

○ Max. working temperature : 315 ℃

○ Magnedrive (agitator) speed : 0 - 1000 rpm

○ AND AD-RC08 Chiller

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Tube furnace

○ Model : LK Labkorea LF-GT530

○ Temperature range : RT - 1000 ℃ (Quartz tube)

○ Tube size : Φ 50 mm

○ Heat zone : L 300 mm

○ Control : Program PID controller

○ Available gas : Argon

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