Surface Physical Chemistry Lab
표면물리화학 연구실
Research Interests
Our research group focuses on an effort to understand various surface phenomena such as adsorption configuration of organic and bio molecules on semiconductor surfaces, reaction mechanism on heterogeneous catalysts, and evaluation of corrosion resistance for alloys.
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Functionalization of semiconductor surface
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Reaction mechanism of catalysts
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Characterization for polarized IR light-emitting material
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Evaluation of corrosion resistance for Ni-based alloys in molten salt
Resources
Ultra-high vacuum (UHV) system
○ Base pressure : 2.0 x 10^-10 Torr
○ Components
- Pumps : Rotary, Turbo, Ion, TSP pumps
- Sputter gun : RBD Instruments IG2 ion source
- Gauge : Granville-Phillips 307 Vacuum gauge
controller with nude gauges & Pirani gauge
Jaguar
: DFT calculations
○ Operating system : Linux CentOS 7
○ Software : SCHRODINGER Jaguar version 10.9
○ Hardware I
- CPU : Intel Xeon Gold 6326 (16-Core, 2.9GHz) * 2EA
- RAM : Samsung DDR4 PC4-25600 ECC 256G
○ Hardware II
- CPU : AMD Ryzen Threadripper 3970X
(32-Core, 3.7GHz)
- RAM : Samsung DDR4 PC4-25600 128G
○ Hardware III
- CPU : Intel Core i7-7820X Skylake-X
(8-Core, 3.6GHz)
- RAM : Samsung DDR4 PC4-21300 32G
Glove box
○ Model : GBI GB-G1000AD
○ Auto control system (8" LCD touch control panel)
○ Atmosphere : Argon
○ Components
- Purification system (55cfm blower system)
- Oxygen analyzer (resolution : 0.1 ppm)
- Moisture analyzer (resolution : 0.1 ppm)
- Auto cooling system with temperature sensor
Autoclave
○ Touch screen control panel
○ Volume : 700 mL
○ Max. working pressure : 155 bar
○ Max. working temperature : 315 ℃
○ Magnedrive (agitator) speed : 0 - 1000 rpm
○ AND AD-RC08 Chiller
Tube furnace
○ Model : LK Labkorea LF-GT530
○ Temperature range : RT - 1000 ℃ (Quartz tube)
○ Tube size : Φ 50 mm
○ Heat zone : L 300 mm
○ Control : Program PID controller
○ Available gas : Argon