Research | Surf

Research Interests

Our research group focuses on an effort to understand various surface phenomena such as adsorption configuration of organic and bio molecules on semiconductor surfaces and reaction mechanism on heterogeneous catalysts.

Functionalization of semiconductor surface
Reaction mechanism of catalysts

Resources

Ultra-high vacuum (UHV) system

○ Base pressure : 2.0 x 10^-10 Torr

○ Components

- Pumps : Rotary, Turbo, Ion, TSP pumps

- Sputter gun : RBD Instruments IG2 ion source

- Gauge : Granville-Phillips 307 Vacuum gauge
controller with nude gauges & Pirani gauge

Jaguar
: DFT calculations

○ Operating system : Linux CentOS 7

○ Software : SCHRODINGER Jaguar version 10.9

○ Hardware I
- CPU : Intel Xeon Gold 6326 (16-Core, 2.9GHz) * 2EA
- RAM : Samsung DDR4 PC4-25600 ECC 256G

○ Hardware II
- CPU : AMD Ryzen Threadripper 3970X

(32-Core, 3.7GHz)
- RAM : Samsung DDR4 PC4-25600 128G

Glove box

○ Model : GBI GB-G1000AD

○ Auto control system (8" LCD touch control panel)

○ Atmosphere : Argon

○ Components

- Purification system (55cfm blower system)

- Oxygen analyzer (resolution : 0.1 ppm)

- Moisture analyzer (resolution : 0.1 ppm)

- Auto cooling system with temperature sensor

Autoclave

○ Touch screen control panel

○ Volume : 700 mL

○ Max. working pressure : 155 bar

○ Max. working temperature : 315 ℃

○ Magnedrive (agitator) speed : 0 - 1000 rpm

○ AND AD-RC08 Chiller

Tube furnace

○ Model : LK Labkorea LF-GT530

○ Temperature range : RT - 1000 ℃ (Quartz tube)

○ Tube size : Φ 50 mm

○ Heat zone : L 300 mm

○ Control : Program PID controller

○ Available gas : Argon